Kia, A.M.; Haufe, N.; Esmaeili, S.; Mart, C.; Utriainen, M.; Puurunen, R.L.; Weinreich, W.
ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition. Nanomaterials 2019, 9, 1035.
https://doi.org/10.3390/nano9071035
AMA Style
Kia AM, Haufe N, Esmaeili S, Mart C, Utriainen M, Puurunen RL, Weinreich W.
ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition. Nanomaterials. 2019; 9(7):1035.
https://doi.org/10.3390/nano9071035
Chicago/Turabian Style
Kia, Alireza M., Nora Haufe, Sajjad Esmaeili, Clemens Mart, Mikko Utriainen, Riikka L. Puurunen, and Wenke Weinreich.
2019. "ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition" Nanomaterials 9, no. 7: 1035.
https://doi.org/10.3390/nano9071035
APA Style
Kia, A. M., Haufe, N., Esmaeili, S., Mart, C., Utriainen, M., Puurunen, R. L., & Weinreich, W.
(2019). ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition. Nanomaterials, 9(7), 1035.
https://doi.org/10.3390/nano9071035