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Nanomaterials 2019, 9(1), 73;

The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography

Key Laboratory of Optoelectronics Technology, Ministry of Education, Beijing University of Technology, Beijing 100124, China
School of Information Engineering, Minzu University of China, Beijing 10083, China
State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083, China
Authors to whom correspondence should be addressed.
Received: 7 December 2018 / Revised: 23 December 2018 / Accepted: 31 December 2018 / Published: 7 January 2019
PDF [4023 KB, uploaded 7 January 2019]


We report a method for fabricating periodic nanostructures on the surface of polydimethylsiloxane (PDMS) using laser interference lithography. The wave-front splitting method was used for the system, as the period and duty cycle can be easily controlled. Indium tin oxide (ITO) glass reveals favorable characteristics for controlling the standing waves distributed in the vertical direction, and was selected as the rigid substrate for the curing of the PDMS prepolymer, photoresist spin coating, and exposure processes. Periodic nanostructures such as gratings, dot, and hole arrays were prepared. This efficient way of fabricating large area periodic nanoscale patterns will be useful for surface plasmonic resonance and wearable electronics. View Full-Text
Keywords: laser interference lithograph; PDMS; periodic nanostructures laser interference lithograph; PDMS; periodic nanostructures

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Wu, J.; Geng, Z.; Xie, Y.; Fan, Z.; Su, Y.; Xu, C.; Chen, H. The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography. Nanomaterials 2019, 9, 73.

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