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Nanomaterials 2019, 9(1), 73; https://doi.org/10.3390/nano9010073

The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography

1
Key Laboratory of Optoelectronics Technology, Ministry of Education, Beijing University of Technology, Beijing 100124, China
2
School of Information Engineering, Minzu University of China, Beijing 10083, China
3
State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083, China
*
Authors to whom correspondence should be addressed.
Received: 7 December 2018 / Revised: 23 December 2018 / Accepted: 31 December 2018 / Published: 7 January 2019
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Abstract

We report a method for fabricating periodic nanostructures on the surface of polydimethylsiloxane (PDMS) using laser interference lithography. The wave-front splitting method was used for the system, as the period and duty cycle can be easily controlled. Indium tin oxide (ITO) glass reveals favorable characteristics for controlling the standing waves distributed in the vertical direction, and was selected as the rigid substrate for the curing of the PDMS prepolymer, photoresist spin coating, and exposure processes. Periodic nanostructures such as gratings, dot, and hole arrays were prepared. This efficient way of fabricating large area periodic nanoscale patterns will be useful for surface plasmonic resonance and wearable electronics. View Full-Text
Keywords: laser interference lithograph; PDMS; periodic nanostructures laser interference lithograph; PDMS; periodic nanostructures
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
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Wu, J.; Geng, Z.; Xie, Y.; Fan, Z.; Su, Y.; Xu, C.; Chen, H. The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography. Nanomaterials 2019, 9, 73.

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