Fabrication of Si/graphene/Si Double Heterostructures by Semiconductor Wafer Bonding towards Future Applications in Optoelectronics
Abstract
1. Introduction
2. Experimental Methods
3. Results and Discussion
4. Conclusions
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
References
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Naito, T.; Tanabe, K. Fabrication of Si/graphene/Si Double Heterostructures by Semiconductor Wafer Bonding towards Future Applications in Optoelectronics. Nanomaterials 2018, 8, 1048. https://doi.org/10.3390/nano8121048
Naito T, Tanabe K. Fabrication of Si/graphene/Si Double Heterostructures by Semiconductor Wafer Bonding towards Future Applications in Optoelectronics. Nanomaterials. 2018; 8(12):1048. https://doi.org/10.3390/nano8121048
Chicago/Turabian StyleNaito, Takenori, and Katsuaki Tanabe. 2018. "Fabrication of Si/graphene/Si Double Heterostructures by Semiconductor Wafer Bonding towards Future Applications in Optoelectronics" Nanomaterials 8, no. 12: 1048. https://doi.org/10.3390/nano8121048
APA StyleNaito, T., & Tanabe, K. (2018). Fabrication of Si/graphene/Si Double Heterostructures by Semiconductor Wafer Bonding towards Future Applications in Optoelectronics. Nanomaterials, 8(12), 1048. https://doi.org/10.3390/nano8121048