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Journal: Nanomaterials, 2018
Volume: 8
Number: 936

Article: Structural and Fluorine Plasma Etching Behavior of Sputter-Deposition Yttrium Fluoride Film
Authors: by Wei-Kai Wang, Yu-Xiu Lin and Yi-Jie Xu
Link: https://www.mdpi.com/2079-4991/8/11/936

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