Berthod, L.; Shavdina, O.; Verrier, I.; Kämpfe, T.; Dellea, O.; Vocanson, F.; Bichotte, M.; Jamon, D.; Jourlin, Y.
Periodic TiO2 Nanostructures with Improved Aspect and Line/Space Ratio Realized by Colloidal Photolithography Technique. Nanomaterials 2017, 7, 316.
https://doi.org/10.3390/nano7100316
AMA Style
Berthod L, Shavdina O, Verrier I, Kämpfe T, Dellea O, Vocanson F, Bichotte M, Jamon D, Jourlin Y.
Periodic TiO2 Nanostructures with Improved Aspect and Line/Space Ratio Realized by Colloidal Photolithography Technique. Nanomaterials. 2017; 7(10):316.
https://doi.org/10.3390/nano7100316
Chicago/Turabian Style
Berthod, Loïc, Olga Shavdina, Isabelle Verrier, Thomas Kämpfe, Olivier Dellea, Francis Vocanson, Maxime Bichotte, Damien Jamon, and Yves Jourlin.
2017. "Periodic TiO2 Nanostructures with Improved Aspect and Line/Space Ratio Realized by Colloidal Photolithography Technique" Nanomaterials 7, no. 10: 316.
https://doi.org/10.3390/nano7100316
APA Style
Berthod, L., Shavdina, O., Verrier, I., Kämpfe, T., Dellea, O., Vocanson, F., Bichotte, M., Jamon, D., & Jourlin, Y.
(2017). Periodic TiO2 Nanostructures with Improved Aspect and Line/Space Ratio Realized by Colloidal Photolithography Technique. Nanomaterials, 7(10), 316.
https://doi.org/10.3390/nano7100316