Article Versions Notes

Zhao X, Miao Y, Su J, Du J, Ren Y, Li B, Dong T, Duan X, Su X, Radamson HH. Optimization of Strain and Doping in Ge/GeSi Nanoscale Multilayers for GOI Short-Wave Infrared Imaging Applications. Nanomaterials. 2026; 16(5):295. https://doi.org/10.3390/nano16050295

Zhao, Xuewei, Yuanhao Miao, Jiale Su, Junhao Du, Yuhui Ren, Ben Li, Tianyu Dong, Xiangliang Duan, Xueyin Su, and Henry H. Radamson. 2026. "Optimization of Strain and Doping in Ge/GeSi Nanoscale Multilayers for GOI Short-Wave Infrared Imaging Applications" Nanomaterials 16, no. 5: 295. https://doi.org/10.3390/nano16050295

Zhao, X., Miao, Y., Su, J., Du, J., Ren, Y., Li, B., Dong, T., Duan, X., Su, X., & Radamson, H. H. (2026). Optimization of Strain and Doping in Ge/GeSi Nanoscale Multilayers for GOI Short-Wave Infrared Imaging Applications. Nanomaterials, 16(5), 295. https://doi.org/10.3390/nano16050295