Memristor Synapse—A Device-Level Critical Review
Abstract
1. Introduction
2. Architectonics and Device Physics

3. Synaptic and Neuromorphic Capabilities

4. Hardware Implementation and Future Scope
4.1. Optical Signal Processing: Artificial Retinas and Vision Systems
4.2. Electrochemical Interfaces: Organ-Level Implants
4.3. Electrophysiological Monitoring: Wearable Sensors
5. Conclusions
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
References
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| Performance Metrics | Optomemristor | Optomemtransistor |
|---|---|---|
| Energy per optical spike | Sub-fJ to few fJ [108] | As low as 0.03 fJ per operation [109] |
| Programming speed (spike width, photocurrent decay) | Slow, seconds [110] | Fast, milliseconds [111] |
| Spectral selectivity | Good, can differentiate several bands of wavelength for multi-channel programming [112] | Excellent, can be designed to respond to a narrow band or specific wavelength via bandgap/channel engineering [113] |
| Optical responsivity | Low, 2.7 A/W [114] | High, 12 A/W [111] |
| Material System | Synaptic Mechanism | Potential Limitations |
|---|---|---|
| Pt/MoS2/Ti | Thermionic emission | Require uniform wafer-scale synthesis; interface trap states could cause variability; and CMOS integration remains limited [115] |
| MoTe2 | Ionic filament and phase transition | Phase instability might occur; sensitive to thermal and moisture; and complex structure limits reproducibility [116] |
| Al/WS2/MoS2/ITO | Sulfur ions distribution at the interface | Short retention and endurance; random filament rupture–rejuvenation might limit large-scale integration maturity [117] |
| Ag/a-BN/Pt | Ag filament and Boron vacancy | Difficult to control the amorphous uniformity [118] |
| Au/Ti/h-BN/Au | Injection of Ti ions into the system | Switching variability; low endurance, tunneling current may be sensitive to film thickness; and difficult to control the native defects in the atomic layers [119] |
| Al/Ti3C2:Ag/Pt | Aggregation of Ag ions around atomic vacancy | Trap density variation can affect linearity [120] |
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Chandrasekaran, S.; Chang, Y.-F.; Simanjuntak, F.M. Memristor Synapse—A Device-Level Critical Review. Nanomaterials 2026, 16, 179. https://doi.org/10.3390/nano16030179
Chandrasekaran S, Chang Y-F, Simanjuntak FM. Memristor Synapse—A Device-Level Critical Review. Nanomaterials. 2026; 16(3):179. https://doi.org/10.3390/nano16030179
Chicago/Turabian StyleChandrasekaran, Sridhar, Yao-Feng Chang, and Firman Mangasa Simanjuntak. 2026. "Memristor Synapse—A Device-Level Critical Review" Nanomaterials 16, no. 3: 179. https://doi.org/10.3390/nano16030179
APA StyleChandrasekaran, S., Chang, Y.-F., & Simanjuntak, F. M. (2026). Memristor Synapse—A Device-Level Critical Review. Nanomaterials, 16(3), 179. https://doi.org/10.3390/nano16030179

