Zhan, J.; Luo, J.; Zhuo, Z.; Shang, C.; Li, Z.; Xiong, S.
Directed Self-Assembly of an Acid-Responsive Block Copolymer for Hole-Shrink Process and Pattern Transfer. Nanomaterials 2025, 15, 1571.
https://doi.org/10.3390/nano15201571
AMA Style
Zhan J, Luo J, Zhuo Z, Shang C, Li Z, Xiong S.
Directed Self-Assembly of an Acid-Responsive Block Copolymer for Hole-Shrink Process and Pattern Transfer. Nanomaterials. 2025; 15(20):1571.
https://doi.org/10.3390/nano15201571
Chicago/Turabian Style
Zhan, Jianghao, Jiacheng Luo, Zixin Zhuo, Caiwei Shang, Zili Li, and Shisheng Xiong.
2025. "Directed Self-Assembly of an Acid-Responsive Block Copolymer for Hole-Shrink Process and Pattern Transfer" Nanomaterials 15, no. 20: 1571.
https://doi.org/10.3390/nano15201571
APA Style
Zhan, J., Luo, J., Zhuo, Z., Shang, C., Li, Z., & Xiong, S.
(2025). Directed Self-Assembly of an Acid-Responsive Block Copolymer for Hole-Shrink Process and Pattern Transfer. Nanomaterials, 15(20), 1571.
https://doi.org/10.3390/nano15201571