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Journal: Nanomaterials, 2025
Volume: 15
Number: 986
986
Article: Low Resistivity and High Carrier Concentration in SnO₂ Thin Films: The Impact of Nitrogen–Hydrogen Annealing Treatments
Authors: by Qi-Zhen Chen, Zhi-Xuan Zhang, Wan-Qiang Fu, Jing-Ru Duan, Yu-Xin Yang, Chao-Nan Chen and Shui-Yang Lien
Link: https://www.mdpi.com/2079-4991/15/13/986

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