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Journal: Nanomaterials, 2024
Volume: 14
Number: 1212
1212
Article: Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
Authors: by Jayant Kumar Lodha, Johan Meersschaut, Mattia Pasquali, Hans Billington, Stefan De Gendt and Silvia Armini
Link: https://www.mdpi.com/2079-4991/14/14/1212

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