Article Versions Notes

Radamson HH, Miao Y, Zhou Z, Wu Z, Kong Z, Gao J, Yang H, Ren Y, Zhang Y, Shi J, et al. CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology. Nanomaterials. 2024; 14(10):837. https://doi.org/10.3390/nano14100837

Radamson, Henry H., Yuanhao Miao, Ziwei Zhou, Zhenhua Wu, Zhenzhen Kong, Jianfeng Gao, Hong Yang, Yuhui Ren, Yongkui Zhang, Jiangliu Shi, and et al. 2024. "CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology" Nanomaterials 14, no. 10: 837. https://doi.org/10.3390/nano14100837

Radamson, H. H., Miao, Y., Zhou, Z., Wu, Z., Kong, Z., Gao, J., Yang, H., Ren, Y., Zhang, Y., Shi, J., Xiang, J., Cui, H., Lu, B., Li, J., Liu, J., Lin, H., Xu, H., Li, M., Cao, J., ... Wang, G. (2024). CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology. Nanomaterials, 14(10), 837. https://doi.org/10.3390/nano14100837