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Nanomaterials
Volume 13
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10.3390/nano13243110
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Communication

Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth

by
João Chaves
1,†,
William Chiappim
2,
Júlia Karnopp
1,
Benedito Neto
1,
Douglas Leite
1,
Argemiro da Silva Sobrinho
1 and
Rodrigo Pessoa
1,*
1
Laboratório de Plasmas e Processos, Departamento de Física, Instituto Tecnológico de Aeronáutica, Praça Marechal Eduardo Gomes 50, São José dos Campos 12228-900, Brazil
2
Laboratório de Plasmas e Aplicações, Departamento de Física, Faculdade de Engenharia de Guaratinguetá, São Paulo State University (UNESP), Guaratinguetá 12516-410, Brazil
*
Author to whom correspondence should be addressed.
†
In memoriam.
Nanomaterials 2023, 13(24), 3110; https://doi.org/10.3390/nano13243110
Submission received: 13 November 2023 / Revised: 4 December 2023 / Accepted: 8 December 2023 / Published: 10 December 2023
(This article belongs to the Special Issue Trends and Prospects in Nanoscale Thin Films and Coatings)
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Abstract

In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al2O3 thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced. Utilizing ex situ PAW achieves up to a 16.4% increase in the growth per cycle (GPC) of Al2O3 films, consistent with results from plasma-enhanced atomic layer deposition (PEALD). Time-resolved mass spectrometry (TRMS) revealed disparities in CH4 partial pressures between TMA reactions with DI water and PAW, with PAW demonstrating enhanced reactivity. Reactive oxygen species (ROS), namely H2O2 and O3, are posited to activate Si(100) substrate sites, thereby improving GPC and film quality. Specifically, Al2O3 films grown with PAW pH = 3.1 displayed optimal stoichiometry, reduced carbon content, and an expanded bandgap. This study thus establishes “PAW-ALD” as a descriptor for this ALD variation and highlights the significance of comprehensive assessments of PAW in ALD processes.
Keywords: plasma-activated water; atomic layer deposition; alumina; growth per cycle plasma-activated water; atomic layer deposition; alumina; growth per cycle
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MDPI and ACS Style

Chaves, J.; Chiappim, W.; Karnopp, J.; Neto, B.; Leite, D.; da Silva Sobrinho, A.; Pessoa, R. Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth. Nanomaterials 2023, 13, 3110. https://doi.org/10.3390/nano13243110

AMA Style

Chaves J, Chiappim W, Karnopp J, Neto B, Leite D, da Silva Sobrinho A, Pessoa R. Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth. Nanomaterials. 2023; 13(24):3110. https://doi.org/10.3390/nano13243110

Chicago/Turabian Style

Chaves, João, William Chiappim, Júlia Karnopp, Benedito Neto, Douglas Leite, Argemiro da Silva Sobrinho, and Rodrigo Pessoa. 2023. "Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth" Nanomaterials 13, no. 24: 3110. https://doi.org/10.3390/nano13243110

APA Style

Chaves, J., Chiappim, W., Karnopp, J., Neto, B., Leite, D., da Silva Sobrinho, A., & Pessoa, R. (2023). Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth. Nanomaterials, 13(24), 3110. https://doi.org/10.3390/nano13243110

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