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Journal: Nanomaterials, 2023
Volume: 13
Number: 1785

Article: Preparation of Remote Plasma Atomic Layer-Deposited HfO2 Thin Films with High Charge Trapping Densities and Their Application in Nonvolatile Memory Devices
Authors: by Jae-Hoon Yoo, Won-Ji Park, So-Won Kim, Ga-Ram Lee, Jong-Hwan Kim, Joung-Ho Lee, Sae-Hoon Uhm and Hee-Chul Lee
Link: https://www.mdpi.com/2079-4991/13/11/1785

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