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Journal: Nanomaterials, 2022
Volume: 12
Number: 591
Article:
Optimization of Gate-All-Around Device to Achieve High Performance and Low Power with Low Substrate Leakage
Authors:
by
Changhyun Yoo, Jeesoo Chang, Sugil Park, Hyungyeong Kim and Jongwook Jeon
Link:
https://www.mdpi.com/2079-4991/12/4/591
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