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Journal: Nanomaterials, 2021
Volume: 11
Number: 1173
Article:
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
Authors:
by
Xiao-Ying Zhang, Yue Yang, Zhi-Xuan Zhang, Xin-Peng Geng, Chia-Hsun Hsu, Wan-Yu Wu, Shui-Yang Lien and Wen-Zhang Zhu
Link:
https://www.mdpi.com/2079-4991/11/5/1173
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