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Journal: Nanomaterials, 2021
Volume: 11
Number: 1173
1173
Article: Deposition and Characterization of RP-ALD SiO₂ Thin Films with Different Oxygen Plasma Powers
Authors: by Xiao-Ying Zhang, Yue Yang, Zhi-Xuan Zhang, Xin-Peng Geng, Chia-Hsun Hsu, Wan-Yu Wu, Shui-Yang Lien and Wen-Zhang Zhu
Link: https://www.mdpi.com/2079-4991/11/5/1173

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