Article Versions Notes

Zhang X-Y, Yang Y, Zhang Z-X, Geng X-P, Hsu C-H, Wu W-Y, Lien S-Y, Zhu W-Z. Deposition and Characterization of RP-ALD SiO₂ Thin Films with Different Oxygen Plasma Powers. Nanomaterials. 2021; 11(5):1173. https://doi.org/10.3390/nano11051173

Zhang, Xiao-Ying, Yue Yang, Zhi-Xuan Zhang, Xin-Peng Geng, Chia-Hsun Hsu, Wan-Yu Wu, Shui-Yang Lien, and Wen-Zhang Zhu. 2021. "Deposition and Characterization of RP-ALD SiO₂ Thin Films with Different Oxygen Plasma Powers" Nanomaterials 11, no. 5: 1173. https://doi.org/10.3390/nano11051173

Zhang, X.-Y., Yang, Y., Zhang, Z.-X., Geng, X.-P., Hsu, C.-H., Wu, W.-Y., Lien, S.-Y., & Zhu, W.-Z. (2021). Deposition and Characterization of RP-ALD SiO₂ Thin Films with Different Oxygen Plasma Powers. Nanomaterials, 11(5), 1173. https://doi.org/10.3390/nano11051173