Kim, S.; Park, W.; Kim, D.; Kang, J.; Lee, J.; Jang, H.Y.; Song, S.H.; Cho, B.; Lee, D.
Novel Exfoliation of High-Quality 2H-MoS2 Nanoflakes for Solution-Processed Photodetector. Nanomaterials 2020, 10, 1045.
https://doi.org/10.3390/nano10061045
AMA Style
Kim S, Park W, Kim D, Kang J, Lee J, Jang HY, Song SH, Cho B, Lee D.
Novel Exfoliation of High-Quality 2H-MoS2 Nanoflakes for Solution-Processed Photodetector. Nanomaterials. 2020; 10(6):1045.
https://doi.org/10.3390/nano10061045
Chicago/Turabian Style
Kim, Seulgi, Woojin Park, Dohoon Kim, Jiyeon Kang, Jaesoung Lee, Hye Yeon Jang, Sung Ho Song, Byungjin Cho, and Dongju Lee.
2020. "Novel Exfoliation of High-Quality 2H-MoS2 Nanoflakes for Solution-Processed Photodetector" Nanomaterials 10, no. 6: 1045.
https://doi.org/10.3390/nano10061045
APA Style
Kim, S., Park, W., Kim, D., Kang, J., Lee, J., Jang, H. Y., Song, S. H., Cho, B., & Lee, D.
(2020). Novel Exfoliation of High-Quality 2H-MoS2 Nanoflakes for Solution-Processed Photodetector. Nanomaterials, 10(6), 1045.
https://doi.org/10.3390/nano10061045