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Journal: NanomaterialsVolume: 10Number: 666
Article: In Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices
  • Authors:
  • Naomi Mizuno1,*,
  • Fernando Camino2,* and
  • Xu Du1,*
Link: https://www.mdpi.com/2079-4991/10/4/666

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