Lederer, M.; Kämpfe, T.; Vogel, N.; Utess, D.; Volkmann, B.; Ali, T.; Olivo, R.; Müller, J.; Beyer, S.; Trentzsch, M.;
et al. Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction. Nanomaterials 2020, 10, 384.
https://doi.org/10.3390/nano10020384
AMA Style
Lederer M, Kämpfe T, Vogel N, Utess D, Volkmann B, Ali T, Olivo R, Müller J, Beyer S, Trentzsch M,
et al. Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction. Nanomaterials. 2020; 10(2):384.
https://doi.org/10.3390/nano10020384
Chicago/Turabian Style
Lederer, Maximilian, Thomas Kämpfe, Norman Vogel, Dirk Utess, Beate Volkmann, Tarek Ali, Ricardo Olivo, Johannes Müller, Sven Beyer, Martin Trentzsch,
and et al. 2020. "Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction" Nanomaterials 10, no. 2: 384.
https://doi.org/10.3390/nano10020384
APA Style
Lederer, M., Kämpfe, T., Vogel, N., Utess, D., Volkmann, B., Ali, T., Olivo, R., Müller, J., Beyer, S., Trentzsch, M., Seidel, K., & Eng, L. M.
(2020). Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction. Nanomaterials, 10(2), 384.
https://doi.org/10.3390/nano10020384