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Journal: Membranes, 2023
Volume: 13
Number: 374

Article: Plasma Enhanced High-Rate Deposition of Advanced Film Materials by Metal Reactive Evaporation in Organosilicon Vapors
Authors: by Andrey Menshakov, Yulia Bruhanova, Polina Skorynina and Anatoliy Medvedev
Link: https://www.mdpi.com/2077-0375/13/4/374

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