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Journal: Appl. Sci., 2019
Volume: 9
Number: 2827
Article:
EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology
Authors:
by
Job Beckers, Tijn van de Ven, Ruud van der Horst, Dmitry Astakhov and Vadim Banine
Link:
https://www.mdpi.com/2076-3417/9/14/2827
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