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Journal: Appl. Sci., 2018
Volume: 8
Number: 528
Article:
Chemical and Molecular Variations in Commercial Epoxide Photoresists for X-ray Lithography
Authors:
by
Vitor Vlnieska, Margarita Zakharova, Martin Börner, Klaus Bade, Jürgen Mohr and Danays Kunka
Link:
https://www.mdpi.com/2076-3417/8/4/528
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