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Article
Peer-Review Record

Using the Taguchi-Genetic Algorithm to Improve Lithographic Photoresist Operating Conditions of Touch Panels to Upgrade After-Develop Inspection

Appl. Sci. 2018, 8(12), 2382; https://doi.org/10.3390/app8122382
by Meng-Hua Li 1,2 and Shen-Tsu Wang 3,*
Reviewer 1: Anonymous
Reviewer 2: Anonymous
Appl. Sci. 2018, 8(12), 2382; https://doi.org/10.3390/app8122382
Submission received: 12 October 2018 / Revised: 5 November 2018 / Accepted: 21 November 2018 / Published: 25 November 2018
(This article belongs to the Section Materials Science and Engineering)

Round  1

Reviewer 1 Report

Usage of genetic algorithm for the analyzed problem is one of the many options available. Why the authors have choosen genetic algorithms instead of classical optimization or of more modern and efficient tools (like particle swarm optimization)?

Author Response

See attached files.

Author Response File: Author Response.pdf


Reviewer 2 Report

The author(s) propose an algorithm to optimize the parameters for the photolithography process for the touch panel fabrication. The paper may be an informative reference for people working on engineering optimization if the following concerns can be addressed:

1. Is this a pure modeling work? How can you get feedback from the physical devices to reiterate your code?

2. The Math in the paper has been very obscure because only very limited information was provided to support them.

3.  Equation 4, 5, and 12 were stretched. Please recover the original dimension.

Author Response

See attached files.

Author Response File: Author Response.pdf

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