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Journal: Applied SciencesVolume: 7Number: 1244
Article: Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
  • Authors:
  • Xiao-Ying Zhang1,
  • Chia-Hsun Hsu2 and
  • Yun-Shao Cho2
  • et al.
Link: https://www.mdpi.com/2076-3417/7/12/1244

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