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Journal: Appl. Sci., 2017
Volume: 7
Number: 1244
Article:
Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
Authors:
by
Xiao-Ying Zhang, Chia-Hsun Hsu, Yun-Shao Cho, Shui-Yang Lien, Wen-Zhang Zhu, Song-Yan Chen, Wei Huang, Lin-Gui Xie, Lian-Dong Chen, Xu-Yang Zou and Si-Xin Huang
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