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Journal: Appl. Sci., 2012
Volume: 2
Number: 233

Article: Optimization of Fluorine Plasma Treatment for Interface Improvement on HfO2/In0.53Ga0.47As MOSFETs
Authors: by Yen-Ting Chen, Yanzhen Wang, Fei Xue, Fei Zhou and Jack C. Lee
Link: https://www.mdpi.com/2076-3417/2/1/233

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