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Journal: Appl. Sci., 2025
Volume: 15
Number: 1441
1441
Article: The Impact of Plasma Intensity on the Unused Rate in Semiconductor Manufacturing: Comparative Analysis Across Intensity Ranges from 30 to 3000
Authors: by Dae Kee Min, Jiyun Woo, Jinwook Kim, Bong-Jae Lee, Eui-chan Jeon and Joohee Lee
Link: https://www.mdpi.com/2076-3417/15/3/1441

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