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Journal: Appl. Sci., 2025
Volume: 15
Number: 12296
Article:
Effects of Plasma Power on By-Product Gas Formation from CHF3 and CH2F2 Process Gases in Semiconductor Etching Processes
Authors:
by
Dae Kee Min, Jiyun Woo, Joohee Lee, Bong-Jae Lee and Eui-chan Jeon
Link:
https://www.mdpi.com/2076-3417/15/22/12296
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