Order Article Reprints
Journal: Applied SciencesVolume: 15Number: 12296
Article: Effects of Plasma Power on By-Product Gas Formation from CHF3 and CH2F2 Process Gases in Semiconductor Etching Processes
- Authors:
- Dae Kee Min 1,
- Jiyun Woo 2 and
- Eui-chan Jeon 5,*
- et al.
MDPI offers high quality article reprints with convenient shipping to destinations worldwide. Each reprint features a 270 gsm bright white cover and 105 gsm premium white paper, bound with two stitches for durability and printed in full color. The cover design is customized to your article and designed to be complimentary to the journal.