Min, D.K.; Woo, J.; Lee, J.; Lee, B.-J.; Jeon, E.-c.
Effects of Plasma Power on By-Product Gas Formation from CHF3 and CH2F2 Process Gases in Semiconductor Etching Processes. Appl. Sci. 2025, 15, 12296.
https://doi.org/10.3390/app152212296
AMA Style
Min DK, Woo J, Lee J, Lee B-J, Jeon E-c.
Effects of Plasma Power on By-Product Gas Formation from CHF3 and CH2F2 Process Gases in Semiconductor Etching Processes. Applied Sciences. 2025; 15(22):12296.
https://doi.org/10.3390/app152212296
Chicago/Turabian Style
Min, Dae Kee, Jiyun Woo, Joohee Lee, Bong-Jae Lee, and Eui-chan Jeon.
2025. "Effects of Plasma Power on By-Product Gas Formation from CHF3 and CH2F2 Process Gases in Semiconductor Etching Processes" Applied Sciences 15, no. 22: 12296.
https://doi.org/10.3390/app152212296
APA Style
Min, D. K., Woo, J., Lee, J., Lee, B.-J., & Jeon, E.-c.
(2025). Effects of Plasma Power on By-Product Gas Formation from CHF3 and CH2F2 Process Gases in Semiconductor Etching Processes. Applied Sciences, 15(22), 12296.
https://doi.org/10.3390/app152212296