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Journal: Appl. Sci., 2025
Volume: 15
Number: 10349
10349
Article: Development of a Low-Particle Emission Linear Atmospheric Plasma Device for Hydrophilization of Silicon Wafers
Authors: by Sho Yoshida, Koki Hihara, Junnosuke Furuya, Taiki Osawa, Akane Yaida, Nobuhiko Nishiyama and Akitoshi Okino
Link: https://www.mdpi.com/2076-3417/15/19/10349

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