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Journal: Appl. Sci., 2025
Volume: 15
Number: 6500

Article: A Multi-Machine and Multi-Modal Drift Detection (M2D2) Framework for Semiconductor Manufacturing
Authors: by Chin-Yi Lin, Tzu-Liang (Bill) Tseng and Tsung-Han Tsai
Link: https://www.mdpi.com/2076-3417/15/12/6500

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