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Journal: Appl. Sci., 2022
Volume: 12
Number: 5110
Article:
High-Temperature Coefficient of Resistance in MoxW1−xS2 Thin Film
Authors:
by
Tsung-Shine Ko, En-Ting Lin, Xin-Wen Huang, Po-Tang Wu and Yi-Lin Yang
Link:
https://www.mdpi.com/2076-3417/12/10/5110
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