Article Versions Notes

Yang Q, Chen F, Tian L, Wang J, Yang N, Hou Y, Huang L, Xie G. Boron Impurity Deposition on a Si(100) Surface in a SiHCl₃-BCl₃-H₂ System for Electronic-Grade Polysilicon Production. Minerals. 2022; 12(5):651. https://doi.org/10.3390/min12050651

Yang, Qinghong, Fengyang Chen, Lin Tian, Jianguo Wang, Ni Yang, Yanqing Hou, Lingyun Huang, and Gang Xie. 2022. "Boron Impurity Deposition on a Si(100) Surface in a SiHCl₃-BCl₃-H₂ System for Electronic-Grade Polysilicon Production" Minerals 12, no. 5: 651. https://doi.org/10.3390/min12050651

Yang, Q., Chen, F., Tian, L., Wang, J., Yang, N., Hou, Y., Huang, L., & Xie, G. (2022). Boron Impurity Deposition on a Si(100) Surface in a SiHCl₃-BCl₃-H₂ System for Electronic-Grade Polysilicon Production. Minerals, 12(5), 651. https://doi.org/10.3390/min12050651