Article Versions Notes

Li X, Cai Y, Lu J, Chovelon J-M, Chen J, Jiang C, Ji Y. Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous Byproducts. Water. 2023; 15(23):4038. https://doi.org/10.3390/w15234038

Li, Xiaoci, Yan Cai, Junhe Lu, Jean-Marc Chovelon, Jing Chen, Canlan Jiang, and Yuefei Ji. 2023. "Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous Byproducts" Water 15, no. 23: 4038. https://doi.org/10.3390/w15234038

Li, X., Cai, Y., Lu, J., Chovelon, J.-M., Chen, J., Jiang, C., & Ji, Y. (2023). Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous Byproducts. Water, 15(23), 4038. https://doi.org/10.3390/w15234038