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Polymers 2017, 9(7), 246;

Photodeprotectable N-Alkoxybenzyl Aromatic Polyamides

Photosensitive Material R&D Department, Hitachi Chemical Co. Ltd., 4-13-1 Hitachi, Ibaraki 317-8555, Japan
Department of Materials and Life Chemistry, Kanagawa University, Rokkakubashi, Kanagawa-ku, Yokohama 221-8686, Japan
Authors to whom correspondence should be addressed.
Received: 22 May 2017 / Revised: 18 June 2017 / Accepted: 21 June 2017 / Published: 24 June 2017
(This article belongs to the Special Issue Functionally Responsive Polymeric Materials)
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N-alkoxybenzyl aromatic polyamides were synthesized by polycondensation of N-alkoxybenzyl aromatic diamine with equimolar dicarboxylic acid chloride in the presence of 2.2 equiv. of pyridine at room temperature for 2 days. The obtained polyamides were mainly cyclic polymers, as determined by means of matrix-assisted laser desorption ionization time-of-flight (MALDI-TOF) mass spectrometry, and showed higher solubility in organic solvents than unprotected aromatic polyamides. Photodeprotection of N-alkoxybenzyl aromatic polyamide film containing photo acid generator (PAG) proceeded well under UV irradiation (5 J/cm2), followed by heating at 130 °C for 15 min. The nature of the polymer end groups of N-alkoxybenzyl aromatic polyamides was found to be crucial for photodeprotection reactivity. These polymers are promising candidates for photosensitive heat-resistant materials for fine Cu wiring formation by electroless Cu plating of high-density semiconductor packaging substrates. View Full-Text
Keywords: N-protected polyamide; polycondensation; photo acid generator; photodeprotection N-protected polyamide; polycondensation; photo acid generator; photodeprotection

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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

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Iwashita, K.; Katoh, H.; Ohta, Y.; Yokozawa, T. Photodeprotectable N-Alkoxybenzyl Aromatic Polyamides. Polymers 2017, 9, 246.

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