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Journal: Polymers, 2015
Volume: 7
Number: 592

Article: Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates
Authors: by Dipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, Justin D. Holmes and Michael A. Morris
Link: https://www.mdpi.com/2073-4360/7/4/592

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