Meng, F.; Wen, X.; Chen, Q.; Zhang, T.; Liu, L.
Degradation Mechanism of Perfluoroelastomer (FFKM) in the Acidic SC2 Solution of Semiconductor Radio Corporation of America (RCA) Cleaning. Polymers 2025, 17, 3081.
https://doi.org/10.3390/polym17223081
AMA Style
Meng F, Wen X, Chen Q, Zhang T, Liu L.
Degradation Mechanism of Perfluoroelastomer (FFKM) in the Acidic SC2 Solution of Semiconductor Radio Corporation of America (RCA) Cleaning. Polymers. 2025; 17(22):3081.
https://doi.org/10.3390/polym17223081
Chicago/Turabian Style
Meng, Fandi, Xiaolong Wen, Qishan Chen, Tao Zhang, and Li Liu.
2025. "Degradation Mechanism of Perfluoroelastomer (FFKM) in the Acidic SC2 Solution of Semiconductor Radio Corporation of America (RCA) Cleaning" Polymers 17, no. 22: 3081.
https://doi.org/10.3390/polym17223081
APA Style
Meng, F., Wen, X., Chen, Q., Zhang, T., & Liu, L.
(2025). Degradation Mechanism of Perfluoroelastomer (FFKM) in the Acidic SC2 Solution of Semiconductor Radio Corporation of America (RCA) Cleaning. Polymers, 17(22), 3081.
https://doi.org/10.3390/polym17223081