Directed Self-Assembly of Cylinder-Forming Block Copolymers Using Pillar Topographic Patterns
Abstract
:1. Introduction
2. Simulation Methods
3. Results
4. Concluding Remarks
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
- Ji, S.; Wan, L.; Liu, C.-C.; Nealey, P.F. Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication. Prog. Polym. Sci. 2016, 54–55, 76–127. [Google Scholar] [CrossRef]
- Cummins, C.; Lundy, R.; Walsh, J.J.; Ponsinet, V.; Fleury, G.; Morris, M.A. Enabling future nanomanufacturing through block copolymer self-assembly: A review. Nano Today 2020, 35, 100936. [Google Scholar] [CrossRef]
- Nicaise, S.M.; Tavakkoli, S.M.; Berggren, K.K. Self-assembly of block copolymers by graphoepitaxy. In Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing; Gronheid, R., Nealey, P., Eds.; Elsevier: Amsterdam, The Netherlands, 2015; pp. 199–232. [Google Scholar]
- Seino, Y.; Kasahara, Y.; Sato, H.; Kobayashi, K.; Miyagi, K.; Minegishi, S.; Kodera, K.; Kanai, H.; Tobana, T.; Kihara, N.; et al. A novel simple sub-15 nm line-and-space patterning process flow using directed self-assembly technology. Microelectron. Eng. 2015, 134, 27–32. [Google Scholar] [CrossRef]
- Giammaria, T.J.; Gharbi, A.; Paquet, A.; Nealey, P.; Tiron, R. Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning. Polymers 2020, 10, 2443. [Google Scholar] [CrossRef]
- Yi, H.; Bao, X.-Y.; Tiberio, R.; Wong, H.-S.P. A General Design Strategy for Block Copolymer Directed Self-Assembly Patterning of Integrated Circuits Contact Holes using anAlphabet Approach. Nano Lett. 2015, 15, 805–812. [Google Scholar] [CrossRef] [PubMed]
- Yi, H.; Bao, X.-Y.; Zhang, J.; Bencher, C.; Chang, L.-W.; Chen, X.; Tiberio, R.; Conway, J.; Dai, H.; Chen, Y.; et al. Flexible Control of Block Copolymer Directed SelfAssembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning. Adv. Mater. 2012, 24, 3107–3114. [Google Scholar] [CrossRef]
- Hu, X.-H.; Zhang, R.; Zhang, X.; Wu, Z.; Zhou, J.; Li, W.; Xiong, S. Focused solar annealing for block copolymer fast self-assembly. Heliyon 2024, 10, e24016. [Google Scholar] [CrossRef] [PubMed]
- Wu, H.; Lou, J.J.-C.; Xiao, H.; Cai, Y.; Yang, Y. Advanced IC Manufacturing Processes. In Handbook of Integrated Circuit Industry; Wang, Y., Chi, M.-H., Lou, J.J.-C., Chen, C.-Z., Eds.; Springer: Singapore, 2023; pp. 1865–1872. [Google Scholar]
- Griffiths, R.A.; Williams, A.; Oakland, C.; Roberts, J.; Vijayaraghavan, A.; Thomson, T. Directed self-assembly of block copolymers for use in bit patterned media fabrication. J. Phys. D Appl. Phys. 2013, 46, 503001. [Google Scholar] [CrossRef]
- Gronheid, R.; Singh, A.; Younkin, T.R.; Delgadillo, P.R.; Nealey, P.; Chan, B.T.; Nafus, K.; Negreira, A.R.; Somervell, M. Rectification of EUV-patterned contact holes using directed self-assembly. In Proceedings of the Advances in Resist Materials and Processing Technology XXX, San Jose, CA, USA, 24–28 February 2013; Volume 8682. [Google Scholar]
- Guo, J.; Janes, D.W.; Mignot, Y.; Johnson, R.C.; Chi, C.; Liu, C.-C.; Meli, L.; Kuroda, T.; DiPaola, D.A.; Tanaka, Y.; et al. LCDU improvement of EUV-patterned vias with DSA. In Proceedings of the Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, San Jose, CA, USA, 24–28 February 2019; Volume 10958. [Google Scholar]
- Mulkens, J.; Slachter, B.; Kubis, M.; Tel, W.; Hinnen, P.; Maslow, M.; Dillen, H.; Ma, E.; Chou, K.; Liu, X.; et al. Holistic approach for overlay and edge placement error to meet the 5 nm technology node requirements. In Proceedings of the Metrology, Inspection, and Process Control for Microlithography XXXII, San Jose, CA, USA, 25 February–1 March 2018; Volume 10585. [Google Scholar]
- De Bisschop, P. Stochastic effects in EUV lithography: Random, local CD variability, and printing failures. J. Micro/Nanolithogr. MEMS MOEMS 2017, 16, 041013. [Google Scholar]
- De Bisschop, P. Stochastic printing failures in extreme ultraviolet lithography. J. Micro/Nanolithogr. MEMS MOEMS 2018, 17, 041011. [Google Scholar] [CrossRef]
- Verstraete, L.; Suh, H.S.; van Bel, J.; Timi, P.H.; Vallat, R.; Bezard, P.; Vandereyken, J.; Beggiato, M.; Tamaddon, A.-H.; Beral, C.; et al. Mitigating stochastics in EUV lithography by directed self-assembly. In Proceedings of the Novel Patterning Technologies 2023, San Jose, CA, USA, 26 February–2 March 2023; Volume 12497. [Google Scholar]
- Tinck, S.; Altamirano-Sanchez, E.; De Schepper, P.; Bogaerts, A. Formation of a Nanoscale SiO2 Capping Layer on Photoresist Lines with an Ar/SiCl4/O2 Inductively Coupled Plasma: A Modeling Investigation. J. Plasma Process. Polym. 2014, 11, 52–62. [Google Scholar] [CrossRef]
- He, Y.; Che, Y.; Que, L. A Top–Down Fabrication Process for Vertical Hollow Silicon Nanopillars. J. Microelectromech. Syst. 2016, 25, 662–667. [Google Scholar] [CrossRef]
- Wi, J.-S.; Lee, H.-S.; Lim, K.; Nam, S.-W.; Kim, H.-M.; Park, S.-Y.; Lee, J.J.; Hong, C.D.; Jin, S.; Kim, K.-B. Fabrication of Silicon Nanopillar Teradot Arrays by Electron-Beam Patterning for Nanoimprint Molds. Small 2008, 4, 2118–2122. [Google Scholar] [CrossRef] [PubMed]
- Barrios, C.A.; Canalejas-Tejero, V. A top-down approach for fabricating three-dimensional closed hollow nanostructures with permeable thin metal walls. Beilstein J. Nanotechnol. 2017, 8, 1231–1237. [Google Scholar] [CrossRef] [PubMed]
- Pinna, M.; Guo, X.; Zvelindovsky, A.V. Block Copolymer Nanocontainers. ACS Nano 2010, 4, 2845–2855. [Google Scholar] [CrossRef] [PubMed]
- Huh, J.; Jung, J.Y.; Lee, J.U.; Cho, H.; Park, S.; Park, C.; Jo, W.H. Supramolecular Assembly of End-Functionalized Polymer Mixtures Confined in Nanospheres. ACS Nano 2011, 5, 115–122. [Google Scholar] [CrossRef] [PubMed]
- Leibler, L. Theory of Microphase Separation in Block Copolymers. Macromolecules 1980, 13, 1602–1617. [Google Scholar] [CrossRef]
- Fredrickson, G.H. Surface Ordering Phenomena in Block Copolymer Melts. Macromolecules 1987, 20, 2535–2542. [Google Scholar] [CrossRef]
- Mayes, A.M.; Olvera de la Cruz, M.; McMullen, W.E. Asymptotic Properties of Higher-Order Vertex Functions for Block Copolymer Melts. Macromolecules 1993, 26, 4050–4051. [Google Scholar] [CrossRef]
- Oono, Y.; Puri, S. A Study of phase-separation dynamics by use of cell dynamical systems. I. Modeling. Phys. Rev. A 1988, 38, 434–453. [Google Scholar] [CrossRef]
- Oono, Y.; Puri, S. A Study of phase-separation dynamics by use of cell dynamical systems. II. Two-dimensional demonstrations. Phys. Rev. A 1988, 38, 1542–1565. [Google Scholar] [CrossRef] [PubMed]
- Roths, T.; Friedrich, C.; Marth, M.; Honerkamp, J. Dynamics and rheology of the morphology of immiscible polymer blends-on modeling and simulation. Rheol. Acta 2002, 38, 211–222. [Google Scholar] [CrossRef]
- Ginzburg, V.V. Nanoparticle/Polymer Blends: Theory and Modeling. In Encyclopedia of Polymer Blends; Isayev, A.I., Ed.; Wiley-VCH: Weinheim, Germany, 2010; pp. 233–268. [Google Scholar]
- Pinna, M.; Zvelindovsky, A.V. Large scale simulation of block copolymers with cell dynamics. Eur. Phys. J. B 2012, 85, 210. [Google Scholar] [CrossRef]
- Diazm, J.; Pinna, M.; Zvelindovsky, A.V.; Asta, A.; Pagonabarraga, I. Cell Dynamic Simulations of Diblock Copolymer/Colloid Systems. Macromol. Theory Simul. 2017, 26, 1600050. [Google Scholar] [CrossRef]
- Teixeira, P.I.C.; Mulder, B.M. Comment on “Study of phase-separation dynamics by use of cell dynamical systems. I. Modeling”. Phys. Rev. E 1997, 55, 3789–3791. [Google Scholar] [CrossRef]
- Han, E.; Stuen, K.O.; Leolukman, M.; Liu, C.-C.; Nealey, P.F.; Gopalan, P. Perpendicular Orientation of Domains in Cylinder-Forming Block Copolymer Thick Films by Controlled Interfacial Interactions for Block Copolymer Melts. Macromolecules 2009, 42, 4896–4901. [Google Scholar] [CrossRef]
- Kim, S.-W.; Kim, E.; Lee, H.; Berry, B.C.; Kim, H.-C.; Ryu, D.Y. Thickness-dependent ordering of perpendicularly oriented lamellae in PS-b-PMMA thin films. Polymer 2015, 74, 63–69. [Google Scholar] [CrossRef]
- Tang, C.; Lennon, E.M.; Fredrickson, G.H.; Kramer, E.J.; Hawker, C.J. Evolution of Block CopolymerLithography to Highly OrderedSquare Arrays. Science 2008, 332, 429–432. [Google Scholar] [CrossRef]
- Vayer, M.; Guliyeva, A.; Warmont, F.; Takano, A.; Matsushita, Y.; Sinturel, C. Transition between tetragonal and hexagonal pattern in binary blends of ABC block copolymers with different chain lengths. Eur. Polym. J. 2020, 138, 109986. [Google Scholar] [CrossRef]
- Singh, A.; Chan, B.T.; Cao, Y.; Lin, G.; Gronheid, R. Using chemo-epitaxial directed self-assembly for repair and frequency multiplication of EUVL contact hole patterns. In Proceedings of the Alternative Lithographic Technologies VI, San Jose, CA, USA, 23–27 February 2014; Volume 9049. [Google Scholar]
- Kim, E. Personal Communication; Samsung Electronics: Suwon, Republic of Korea, 2017. [Google Scholar]
Disclaimer/Publisher’s Note: The statements, opinions and data contained in all publications are solely those of the individual author(s) and contributor(s) and not of MDPI and/or the editor(s). MDPI and/or the editor(s) disclaim responsibility for any injury to people or property resulting from any ideas, methods, instructions or products referred to in the content. |
© 2024 by the author. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
Share and Cite
Huh, J. Directed Self-Assembly of Cylinder-Forming Block Copolymers Using Pillar Topographic Patterns. Polymers 2024, 16, 881. https://doi.org/10.3390/polym16070881
Huh J. Directed Self-Assembly of Cylinder-Forming Block Copolymers Using Pillar Topographic Patterns. Polymers. 2024; 16(7):881. https://doi.org/10.3390/polym16070881
Chicago/Turabian StyleHuh, June. 2024. "Directed Self-Assembly of Cylinder-Forming Block Copolymers Using Pillar Topographic Patterns" Polymers 16, no. 7: 881. https://doi.org/10.3390/polym16070881
APA StyleHuh, J. (2024). Directed Self-Assembly of Cylinder-Forming Block Copolymers Using Pillar Topographic Patterns. Polymers, 16(7), 881. https://doi.org/10.3390/polym16070881