Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition
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Research Unit Plasma Technology, Department of Applied Physics, Faculty of Engineering and Architecture, Ghent University, Sint-Pietersnieuwstraat 41, B4, 9000 Ghent, Belgium
2
Faculty of Chemistry, Brno University of Technology, Purkyňova 118, 612 00 Brno, Czech Republic
*
Author to whom correspondence should be addressed.
Polymers 2020, 12(2), 354; https://doi.org/10.3390/polym12020354
Received: 29 November 2019
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Revised: 24 January 2020
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Accepted: 28 January 2020
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Published: 6 February 2020
(This article belongs to the Special Issue Polymer Biointerfaces)
In this work, the potential of a microwave (MW)-induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate non-uniform monomer distribution near the substrate and the dependency of the deposition area on the monomer-containing gas flow rate. A non-homogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C–O/C–C ratio and a higher wettability of the deposited coatings.
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Keywords:
atmospheric pressure plasma jet (APPJ); microwave (MW) discharge; thin film deposition; optical emission spectroscopy (OES); Comsol MultiPhysics; methyl methacrylate (MMA); styrene
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MDPI and ACS Style
Narimisa, M.; Krčma, F.; Onyshchenko, Y.; Kozáková, Z.; Morent, R.; De Geyter, N. Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition. Polymers 2020, 12, 354. https://doi.org/10.3390/polym12020354
AMA Style
Narimisa M, Krčma F, Onyshchenko Y, Kozáková Z, Morent R, De Geyter N. Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition. Polymers. 2020; 12(2):354. https://doi.org/10.3390/polym12020354
Chicago/Turabian StyleNarimisa, Mehrnoush, František Krčma, Yuliia Onyshchenko, Zdenka Kozáková, Rino Morent, and Nathalie De Geyter. 2020. "Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition" Polymers 12, no. 2: 354. https://doi.org/10.3390/polym12020354
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