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Journal: Polymers, 2019
Volume: 11
Number: 1923
1923
Article: Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation
Authors: by Juhae Park, Sung-Gyu Lee, Yannick Vesters, Joren Severi, Myungwoong Kim, Danilo De Simone, Hye-Keun Oh and Su-Mi Hur
Link: https://www.mdpi.com/2073-4360/11/12/1923

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