Article Versions Notes

Park J, Lee S-G, Vesters Y, Severi J, Kim M, De Simone D, Oh H-K, Hur S-M. Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation. Polymers. 2019; 11(12):1923. https://doi.org/10.3390/polym11121923

Park, Juhae, Sung-Gyu Lee, Yannick Vesters, Joren Severi, Myungwoong Kim, Danilo De Simone, Hye-Keun Oh, and Su-Mi Hur. 2019. "Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation" Polymers 11, no. 12: 1923. https://doi.org/10.3390/polym11121923

Park, J., Lee, S.-G., Vesters, Y., Severi, J., Kim, M., De Simone, D., Oh, H.-K., & Hur, S.-M. (2019). Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation. Polymers, 11(12), 1923. https://doi.org/10.3390/polym11121923