Saikia, R.; Kakati, B.; Hazarika, T.; Sharma, S.; Rajbongshi, T.; Das, M.; Biswas, S.; Kundu, S.; Mahanta, M.K.
Fabrication of Microcrystalline Silicon Thin Film by Ionized Physical Vapor Deposition Process. Crystals 2025, 15, 106.
https://doi.org/10.3390/cryst15020106
AMA Style
Saikia R, Kakati B, Hazarika T, Sharma S, Rajbongshi T, Das M, Biswas S, Kundu S, Mahanta MK.
Fabrication of Microcrystalline Silicon Thin Film by Ionized Physical Vapor Deposition Process. Crystals. 2025; 15(2):106.
https://doi.org/10.3390/cryst15020106
Chicago/Turabian Style
Saikia, Rimlee, Bharat Kakati, Tonmoi Hazarika, Shivam Sharma, Tapan Rajbongshi, Mausumi Das, Subir Biswas, Sarathi Kundu, and Manoj Kumar Mahanta.
2025. "Fabrication of Microcrystalline Silicon Thin Film by Ionized Physical Vapor Deposition Process" Crystals 15, no. 2: 106.
https://doi.org/10.3390/cryst15020106
APA Style
Saikia, R., Kakati, B., Hazarika, T., Sharma, S., Rajbongshi, T., Das, M., Biswas, S., Kundu, S., & Mahanta, M. K.
(2025). Fabrication of Microcrystalline Silicon Thin Film by Ionized Physical Vapor Deposition Process. Crystals, 15(2), 106.
https://doi.org/10.3390/cryst15020106
