Liang, X.; Dong, L.; Chen, Y.; Qi, C.; Xu, C.; Zhang, W.; Bi, L.; Zhao, L.
Boosting Charge Separation in NiS/C3N4 Type-II Heterojunction for Efficient Photoelectrocatalytic Water Reduction. Crystals 2025, 15, 1004.
https://doi.org/10.3390/cryst15121004
AMA Style
Liang X, Dong L, Chen Y, Qi C, Xu C, Zhang W, Bi L, Zhao L.
Boosting Charge Separation in NiS/C3N4 Type-II Heterojunction for Efficient Photoelectrocatalytic Water Reduction. Crystals. 2025; 15(12):1004.
https://doi.org/10.3390/cryst15121004
Chicago/Turabian Style
Liang, Xiaobo, Lingdan Dong, Yanning Chen, Chunhai Qi, Chunyi Xu, Wenhao Zhang, Lingling Bi, and Liang Zhao.
2025. "Boosting Charge Separation in NiS/C3N4 Type-II Heterojunction for Efficient Photoelectrocatalytic Water Reduction" Crystals 15, no. 12: 1004.
https://doi.org/10.3390/cryst15121004
APA Style
Liang, X., Dong, L., Chen, Y., Qi, C., Xu, C., Zhang, W., Bi, L., & Zhao, L.
(2025). Boosting Charge Separation in NiS/C3N4 Type-II Heterojunction for Efficient Photoelectrocatalytic Water Reduction. Crystals, 15(12), 1004.
https://doi.org/10.3390/cryst15121004