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Article

Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples

1
Paul Scherrer Institut (PSI), 5232 Villigen, Switzerland
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Laboratory for Mesoscopic Systems, Department of Materials, ETH Zurich, 8093 Zurich, Switzerland
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Scientific Center for Optical and Electron Microscopy, ETH Zurich, 8093 Zurich, Switzerland
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INNOVENT e.V. Technologieentwicklung Jena, 07745 Jena, Germany
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Helmholtz-Zentrum Berlin, 14109 Berlin, Germany
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Laboratory for Magnetism and Interface Physics, Department of Materials, ETH Zurich, 8093 Zurich, Switzerland
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Max Planck Institute for Intelligent Systems, 70569 Stuttgart, Germany
*
Authors to whom correspondence should be addressed.
Academic Editor: Sergio Brutti
Crystals 2021, 11(5), 546; https://doi.org/10.3390/cryst11050546
Received: 25 March 2021 / Revised: 2 May 2021 / Accepted: 3 May 2021 / Published: 14 May 2021
(This article belongs to the Special Issue Advanced Imaging Methods)
We employ xenon (Xe) plasma focused ion beam (PFIB) milling to obtain soft X-ray transparent windows out of bulk samples. The use of a Xe PFIB allows for the milling of thin windows (several 100 nm thick) with areas of the order of 100 µm × 100 µm into bulk substrates. In addition, we present an approach to empirically determine the transmission level of such windows during fabrication by correlating their electron and soft X-ray transparencies. We perform scanning transmission X-ray microscopy (STXM) imaging on a sample obtained by Xe PFIB milling to demonstrate the conceptual feasibility of the technique. Our thinning approach provides a fast and simplified method for facilitating soft X-ray transmission measurements of epitaxial samples and it can be applied to a variety of different sample systems and substrates that are otherwise not accessible. View Full-Text
Keywords: Xe plasma focused ion beam; soft X-ray transparency; transmission X-ray microscopy Xe plasma focused ion beam; soft X-ray transparency; transmission X-ray microscopy
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MDPI and ACS Style

Mayr, S.; Finizio, S.; Reuteler, J.; Stutz, S.; Dubs, C.; Weigand, M.; Hrabec, A.; Raabe, J.; Wintz, S. Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples. Crystals 2021, 11, 546. https://doi.org/10.3390/cryst11050546

AMA Style

Mayr S, Finizio S, Reuteler J, Stutz S, Dubs C, Weigand M, Hrabec A, Raabe J, Wintz S. Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples. Crystals. 2021; 11(5):546. https://doi.org/10.3390/cryst11050546

Chicago/Turabian Style

Mayr, Sina, Simone Finizio, Joakim Reuteler, Stefan Stutz, Carsten Dubs, Markus Weigand, Aleš Hrabec, Jörg Raabe, and Sebastian Wintz. 2021. "Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples" Crystals 11, no. 5: 546. https://doi.org/10.3390/cryst11050546

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