Spindlberger, L.; Aberl, J.; Polimeni, A.; Schuster, J.; Hörschläger, J.; Truglas, T.; Groiss, H.; Schäffler, F.; Fromherz, T.; Brehm, M.
In-Situ Annealing and Hydrogen Irradiation of Defect-Enhanced Germanium Quantum Dot Light Sources on Silicon. Crystals 2020, 10, 351.
https://doi.org/10.3390/cryst10050351
AMA Style
Spindlberger L, Aberl J, Polimeni A, Schuster J, Hörschläger J, Truglas T, Groiss H, Schäffler F, Fromherz T, Brehm M.
In-Situ Annealing and Hydrogen Irradiation of Defect-Enhanced Germanium Quantum Dot Light Sources on Silicon. Crystals. 2020; 10(5):351.
https://doi.org/10.3390/cryst10050351
Chicago/Turabian Style
Spindlberger, Lukas, Johannes Aberl, Antonio Polimeni, Jeffrey Schuster, Julian Hörschläger, Tia Truglas, Heiko Groiss, Friedrich Schäffler, Thomas Fromherz, and Moritz Brehm.
2020. "In-Situ Annealing and Hydrogen Irradiation of Defect-Enhanced Germanium Quantum Dot Light Sources on Silicon" Crystals 10, no. 5: 351.
https://doi.org/10.3390/cryst10050351
APA Style
Spindlberger, L., Aberl, J., Polimeni, A., Schuster, J., Hörschläger, J., Truglas, T., Groiss, H., Schäffler, F., Fromherz, T., & Brehm, M.
(2020). In-Situ Annealing and Hydrogen Irradiation of Defect-Enhanced Germanium Quantum Dot Light Sources on Silicon. Crystals, 10(5), 351.
https://doi.org/10.3390/cryst10050351