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Journal: Catalysts, 2021
Volume: 11
Number: 91
91
Article: Low Temperature Deposition of TiO₂ Thin Films through Atmospheric Pressure Plasma Jet Processing
Authors: by Suresh Gosavi, Rena Tabei, Nitish Roy, Sanjay S. Latthe, Yuvaraj M. Hunge, Norihiro Suzuki, Takeshi Kondo, Makoto Yuasa, Katsuya Teshima, Akira Fujishima and Chiaki Terashima
Link: https://www.mdpi.com/2073-4344/11/1/91

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