Article Versions Notes

Gosavi S, Tabei R, Roy N, Latthe SS, Hunge YM, Suzuki N, Kondo T, Yuasa M, Teshima K, Fujishima A, et al. Low Temperature Deposition of TiO₂ Thin Films through Atmospheric Pressure Plasma Jet Processing. Catalysts. 2021; 11(1):91. https://doi.org/10.3390/catal11010091

Gosavi, Suresh, Rena Tabei, Nitish Roy, Sanjay S. Latthe, Yuvaraj M. Hunge, Norihiro Suzuki, Takeshi Kondo, Makoto Yuasa, Katsuya Teshima, Akira Fujishima, and et al. 2021. "Low Temperature Deposition of TiO₂ Thin Films through Atmospheric Pressure Plasma Jet Processing" Catalysts 11, no. 1: 91. https://doi.org/10.3390/catal11010091

Gosavi, S., Tabei, R., Roy, N., Latthe, S. S., Hunge, Y. M., Suzuki, N., Kondo, T., Yuasa, M., Teshima, K., Fujishima, A., & Terashima, C. (2021). Low Temperature Deposition of TiO₂ Thin Films through Atmospheric Pressure Plasma Jet Processing. Catalysts, 11(1), 91. https://doi.org/10.3390/catal11010091