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Journal: Catalysts, 2020
Volume: 10
Number: 534

Article: Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition
Authors: by Alessio Aufoujal, Ulrich Legrand, Jean-Luc Meunier and Jason Robert Tavares
Link: https://www.mdpi.com/2073-4344/10/5/534

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