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Journal: Catalysts, 2020
Volume: 10
Number: 534
Article:
Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition
Authors:
by
Alessio Aufoujal, Ulrich Legrand, Jean-Luc Meunier and Jason Robert Tavares
Link:
https://www.mdpi.com/2073-4344/10/5/534
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