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Journal: Micromachines, 2016
Volume: 7
Number: 232

Article: Fabrication of SiNx Thin Film of Micro Dielectric Barrier Discharge Reactor for Maskless Nanoscale Etching
Authors: by Qiang Li, Jie Liu, Yichuan Dai, Wushu Xiang, Man Zhang, Hai Wang and Li Wen
Link: https://www.mdpi.com/2072-666X/7/12/232

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