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Journal: Micromachines, 2016
Volume: 7
Number: 232
Article:
Fabrication of SiNx Thin Film of Micro Dielectric Barrier Discharge Reactor for Maskless Nanoscale Etching
Authors:
by
Qiang Li, Jie Liu, Yichuan Dai, Wushu Xiang, Man Zhang, Hai Wang and Li Wen
Link:
https://www.mdpi.com/2072-666X/7/12/232
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