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Journal: Micromachines, 2026
Volume: 17
Number: 714
714
Article: High-Precision LCCD-Based Focus Metrology for I-Line Lithography: Multi-Sample Repeatability and Adaptability Evaluation
Authors: by Hengrui Guan, Xinxin Zhao, Yuheng Chu, Wuhao Liu, Yongxing Yang, Dapeng Kuang, Maoxin Song, Mingchun Ling and Jin Hong
Link: https://www.mdpi.com/2072-666X/17/6/714

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