Guan, H.; Zhao, X.; Chu, Y.; Liu, W.; Yang, Y.; Kuang, D.; Song, M.; Ling, M.; Hong, J.
High-Precision LCCD-Based Focus Metrology for I-Line Lithography: Multi-Sample Repeatability and Adaptability Evaluation. Micromachines 2026, 17, 714.
https://doi.org/10.3390/mi17060714
AMA Style
Guan H, Zhao X, Chu Y, Liu W, Yang Y, Kuang D, Song M, Ling M, Hong J.
High-Precision LCCD-Based Focus Metrology for I-Line Lithography: Multi-Sample Repeatability and Adaptability Evaluation. Micromachines. 2026; 17(6):714.
https://doi.org/10.3390/mi17060714
Chicago/Turabian Style
Guan, Hengrui, Xinxin Zhao, Yuheng Chu, Wuhao Liu, Yongxing Yang, Dapeng Kuang, Maoxin Song, Mingchun Ling, and Jin Hong.
2026. "High-Precision LCCD-Based Focus Metrology for I-Line Lithography: Multi-Sample Repeatability and Adaptability Evaluation" Micromachines 17, no. 6: 714.
https://doi.org/10.3390/mi17060714
APA Style
Guan, H., Zhao, X., Chu, Y., Liu, W., Yang, Y., Kuang, D., Song, M., Ling, M., & Hong, J.
(2026). High-Precision LCCD-Based Focus Metrology for I-Line Lithography: Multi-Sample Repeatability and Adaptability Evaluation. Micromachines, 17(6), 714.
https://doi.org/10.3390/mi17060714
